Art
J-GLOBAL ID：200902150976334659   Reference number：95A0128130

High-current arc-A new source for high-rate deposition.

高電流アーク 高速成膜の新しいソース
Author (3)：
SIEMROTH P

About SIEMROTH P

(Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU)

About Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU

, 
SCHUELKE T

About SCHUELKE T

(Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU)

About Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU

, 
WITKE T

About WITKE T

(Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU)

About Fraunhofer-Inst. Material Physics and Thin Film Engineering (IWS), Dresden, DEU


Material：
Surface & Coatings Technology  (Surf Coat Technol)

About Surface & Coatings Technology


Volume： 68/69  Page： 314-319  Publication year： Dec. 1994 
JST Material Number： D0205C  ISSN： 0257-8972  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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vacuum deposition

About vacuum deposition

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

,  Vapor plating 
(WC08022K)

About Vapor plating

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
高電流

About 高電流

, 
アーク

About アーク

, 
高速成膜

About 高速成膜

, 
ソース

About ソース


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