Art
J-GLOBAL ID：200902151765146941   Reference number：01A0547722

Removal of toxic metal ions from wastewater by semiconductor photocatalysis.

半導体光触媒による廃水から有毒金属イオンの除去
Author (2)：
CHEN D

About CHEN D

(National Univ. Singapore, Singapore, SGP)

About National Univ. Singapore, Singapore, SGP

, 
RAY A K

About RAY A K

(National Univ. Singapore, Singapore, SGP)

About National Univ. Singapore, Singapore, SGP


Material：
Chemical Engineering Science  (Journal International de Genie Chimique)

About Chemical Engineering Science


Volume： 56  Issue： 4  Page： 1561-1570  Publication year： Feb. 2001 
JST Material Number： B0254A  ISSN： 0009-2509  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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*metal ion

About metal ion

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Chemical treatment of sewage and wastewater 
(SC03050W)

About Chemical treatment of sewage and wastewater

,  Chemical reaction engineering,chemical kinetics 
(XE01020M)

About Chemical reaction engineering,chemical kinetics

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
光触媒

About 光触媒

, 
廃水

About 廃水

, 
金属イオン

About 金属イオン


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