Thermal stability of ultrathin ZrO<sub>2</sub> films prepared by chemical vapor deposition on Si(100).

JEON T S; WHITE J M; KWONG D L

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J-GLOBAL ID：200902152468440268 Reference number：01A0310685

Thermal stability of ultrathin ZrO₂ films prepared by chemical vapor deposition on Si(100).

化学気相蒸着によりSi(100)上に作製したZrO₂超薄膜の熱安定性

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Author (3)： , ,
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Volume： 78 Issue： 3 Page： 368-370 Publication year： Jan. 15, 2001
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Dielectrics in general , Oxide thin films

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Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100).

Thermal stability of ultrathin ZrO₂ films prepared by chemical vapor deposition on Si(100).