Art
J-GLOBAL ID：200902155130134527   Reference number：95A0976686

Controlling Fluorine Concentration and Thermal Annealing Effect on Liquid-Phase Deposited SiO2-xFx Films.

液相沈着SiO2-x膜に対する制御したふっ素濃度及び熱アニーリングの効果
Author (2)：
YEH C-F

About YEH C-F

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN

, 
CHEN C-L

About CHEN C-L

(National Chiao Tung Univ., Hsinchu, TWN)

About National Chiao Tung Univ., Hsinchu, TWN


Material：
Journal of the Electrochemical Society  (J Electrochem Soc)

About Journal of the Electrochemical Society


Volume： 142  Issue： 10  Page： 3579-3583  Publication year： Oct. 1995 
JST Material Number： C0285A  ISSN： 1945-7111  CODEN： JESOAN  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
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All keywords is available on JDreamIII(charged).
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silicon oxide

About silicon oxide

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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FTIR(spectroscopy)

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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
液相

About 液相

, 
沈着

About 沈着

, 
ふっ素

About ふっ素

, 
熱アニーリング

About 熱アニーリング


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