H<sub>2</sub> damage of ferroelectric Pb(Zr,Ti)O<sub>3</sub> thin-film capacitors-The role of catalytic and adsorptive activity of the top electrode.

SHIMAMOTO Y; KUSHIDA-ABDELGHAFAR K; MIKI H; FUJISAKI Y

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J-GLOBAL ID：200902158200574529 Reference number：97A0624517

H₂ damage of ferroelectric Pb(Zr,Ti)O₃ thin-film capacitors-The role of catalytic and adsorptive activity of the top electrode.

強誘電体Pb(Zr,Ti)O₃薄膜キャパシタのH₂損傷上部電極の触媒および吸着活性の役割

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Material：
Volume： 70 Issue： 23 Page： 3096-3097 Publication year： Jun. 09, 1997
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Ferroelectrics,antiferroelectrics and ferroelasticity , Semiconductor integrated circuit

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H2 damage of ferroelectric Pb(Zr,Ti)O3 thin-film capacitors-The role of catalytic and adsorptive activity of the top electrode.

H₂ damage of ferroelectric Pb(Zr,Ti)O₃ thin-film capacitors-The role of catalytic and adsorptive activity of the top electrode.