Art
J-GLOBAL ID：200902159116947138   Reference number：95A0897807

Reactive ion etching of GaN using CHF3/Ar and C2ClF5/Ar plasmas.

CHF3/Ar及びC2ClF5/ArプラズマによるGaNの反応性イオンエッチング
Author (3)：
LEE H

About LEE H

(Stanford Univ., California)

About Stanford Univ., California

, 
OBERMAN D B

About OBERMAN D B

(Stanford Univ., California)

About Stanford Univ., California

, 
HARRIS J S JR

About HARRIS J S JR

(Stanford Univ., California)

About Stanford Univ., California


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 67  Issue： 12  Page： 1754-1756  Publication year： Sep. 18, 1995 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
aliphatic fluorine compound

About aliphatic fluorine compound

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
fluoroform

About fluoroform

,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=95A0897807&from=J-GLOBAL&jstjournalNo=H0613A") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Applications of plasma 
(BJ02110K)

About Applications of plasma

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
Ar

About Ar

, 
プラズマ

About プラズマ

, 
GaN

About GaN

, 
反応性イオンエッチング

About 反応性イオンエッチング


Return to Previous Page

TOP

BOTTOM