Surface passivation of silicon solar cells using plasma-enhanced chemical-vapour-deposited SiN films and thin thermal SiO<sub>2</sub>/plasma SiN stacks.

SCHMIDT J; KERR M; CUEVAS A

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J-GLOBAL ID：200902159215787843 Reference number：01A0366097

Surface passivation of silicon solar cells using plasma-enhanced chemical-vapour-deposited SiN films and thin thermal SiO₂/plasma SiN stacks.

プラズマ増強化学蒸着SiN薄膜,ならびに熱蒸着SiO₂/プラズマ蒸着SiN薄膜スタックを用いたシリコン太陽電池に関する表面パッシベーション

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Volume： 16 Issue： 3 Page： 164-170 Publication year： Mar. 2001
JST Material Number： E0503B ISSN： 0268-1242 CODEN： SSTEET Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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Surface passivation of silicon solar cells using plasma-enhanced chemical-vapour-deposited SiN films and thin thermal SiO2/plasma SiN stacks.

Surface passivation of silicon solar cells using plasma-enhanced chemical-vapour-deposited SiN films and thin thermal SiO₂/plasma SiN stacks.