Effect of ion bombardment on the properties of B<sub>4</sub>C thin films deposited by RF sputtering.

LOUSA A; MARTINEZ E; ESTEVE J; PASCUAL E

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J-GLOBAL ID：200902160203785169 Reference number：00A0113469

Effect of ion bombardment on the properties of B₄C thin films deposited by RF sputtering.

RFスパッタリングで堆積したB₄C薄膜の特性に対するイオン衝撃の影響

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Volume： 355/356 Page： 210-213 Publication year： Nov. 1999
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Mechanical properties of solids in general

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Effect of ion bombardment on the properties of B4C thin films deposited by RF sputtering.

Effect of ion bombardment on the properties of B₄C thin films deposited by RF sputtering.