Art
J-GLOBAL ID：200902160939549144   Reference number：97A0024146

Sequential lateral solidification of thin silicon films on SiO2.

SiO2上の薄いシリコン膜の逐次横方向凝固
Author (2)：
SPOSILI R S

About SPOSILI R S

(Columbia Univ., New York)

About Columbia Univ., New York

, 
IM J S

About IM J S

(Columbia Univ., New York)

About Columbia Univ., New York


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 69  Issue： 19  Page： 2864-2866  Publication year： Nov. 04, 1996 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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silicon

About silicon

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
レーザ結晶化

About レーザ結晶化


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films 
(BK14040E)

About Semiconductor thin films

,  Materials of solid-state devices 
(NC03020K)

About Materials of solid-state devices

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
SiO2

About SiO2

, 
シリコン膜

About シリコン膜

, 
逐次

About 逐次

, 
横方向

About 横方向

, 
凝固

About 凝固


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