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J-GLOBAL ID：200902162915752170   Reference number：97A0191908

Low Resistivity FIB Depositions Within High Aspect Ratio Holes.

高アスペクト比の孔内の低固有抵抗FIB蒸着
Author (2)：
LEE R A

About LEE R A

(Schlumberger Technol., California)

About Schlumberger Technol., California

, 
LUNDQUIST T R

About LUNDQUIST T R

(Schlumberger Technol., California)

About Schlumberger Technol., California


Material：
Proceedings of the International Symposium for Testing and Failure Analysis  (Proceedings. ISTFA)

About Proceedings of the International Symposium for Testing and Failure Analysis


Volume： 22nd  Page： 85-88  Publication year： 1996 
JST Material Number： D0658B  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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All keywords is available on JDreamIII(charged).
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aspect ratio

About aspect ratio

,...
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JST classification (1)：
JST classification
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Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
高アスペクト比

About 高アスペクト比

, 
固有抵抗

About 固有抵抗

, 
FIB

About FIB

, 
蒸着

About 蒸着


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