Art
J-GLOBAL ID：200902163659492693   Reference number：01A0054278

Copper metallization for high performance silicon technology.

高性能けい素技術のための銅のメタライゼーション
Author (4)：
ROSENBERG R

About ROSENBERG R

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York

, 
EDELSTEIN D C

About EDELSTEIN D C

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York

, 
HU C-K

About HU C-K

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York

, 
RODBELL K P

About RODBELL K P

(IBM T.J. Watson Res. Center, New York)

About IBM T.J. Watson Res. Center, New York


Material：
Annual Review of Materials Science  (Annu Rev Mater Sci)

About Annual Review of Materials Science


Volume： 30  Page： 229-262  Publication year： 2000 
JST Material Number： D0856A  ISSN： 0084-6600  Document type： Article
Article type： 文献レビュー  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
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*silicon

About silicon

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films 
(BK14030T)

About Metallic thin films

,  Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
高性能

About 高性能

, 
けい素

About けい素

, 
銅

About 銅

, 
メタライゼーション

About メタライゼーション


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