Structural characterization of aluminum films deposited on sputtered-titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane.

LI X; KIM B-Y; RHEE S-W

Art

J-GLOBAL ID：200902164476541942 Reference number：96A0033772

Structural characterization of aluminum films deposited on sputtered-titanium nitride/silicon substrate by metalorganic chemical vapor deposition from dimethylethylamine alane.

スパッタした窒化チタン/シリコン基板上にジメチルエチルアミンアランを用いた有機金属化学蒸着により堆積したアルミニウム膜の構造評価

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Author (3)： , ,
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Volume： 67 Issue： 23 Page： 3426-3428 Publication year： Dec. 04, 1995
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Metallic thin films , Lattice defects in metals

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