Nitrogen plasma annealing for low temperature Ta<sub>2</sub>O<sub>5</sub> films.

ALERS G B; FLEMING R M; WONG Y H; DENNIS B; PINCZUK A; REDINBO G; URDAHL R; ONG E; HASAN Z

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J-GLOBAL ID：200902165459818430 Reference number：98A0368681

Nitrogen plasma annealing for low temperature Ta₂O₅ films.

低温Ta₂O₅膜に対する窒素プラズマアニーリング

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Volume： 72 Issue： 11 Page： 1308-1310 Publication year： Mar. 16, 1998
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films

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Nitrogen plasma annealing for low temperature Ta2O5 films.

Nitrogen plasma annealing for low temperature Ta₂O₅ films.