Art
J-GLOBAL ID：200902168671190734   Reference number：01A0652526

Porous SOG Films for Ultra Low-k Application.

超低誘電率多孔質SOG膜 ISM1.5
Author (1)：
MURAKAMI HIROHIKO

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(日本真空技術)

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Material：
半導体・集積回路技術シンポジウム講演論文集  (Proceedings of the Symposium on Semiconductors and Integrated Circuits Technology)

About 半導体・集積回路技術シンポジウム講演論文集


Volume： 60th  Page： 53-58  Publication year： Jun. 06, 2001 
JST Material Number： F0108B  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*dielectric thin film

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,...
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Thesaurus term/Semi thesaurus term
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CMP【研磨】

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JST classification (1)：
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Semiconductor integrated circuit 
(NC03162T)

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Terms in the title (3)：
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低誘電率

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, 
多孔質

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, 
SOG

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