Art
J-GLOBAL ID：200902169469345269
Reference number：96A0597670
Total photoelectric yields of aluminum thin films near the Al L2,3 edge.
アルミニウム薄膜のAl L2,3吸収端付近における全光電子収率
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Author (1)：
Material：
Volume：
79
Page：
17-20
Publication year：
May. 1996
JST Material Number：
D0266C
ISSN：
0368-2048
Document type：
Article
Article type：
原著論文
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
X-ray spectra in general.Including X-ray
, Electron spectroscopy
Terms in the title (6)：
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