Art
J-GLOBAL ID：200902170934707480
Reference number：99A0780037
Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition.
有機金属化学蒸着によるルテニウム薄膜の堆積と特性付け
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Author (5)：
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Material：
Volume：
99
Issue：
230(ED99 113-144)
Page：
139-144
Publication year：
Jul. 23, 1999
JST Material Number：
S0532B
ISSN：
0913-5685
Document type：
Proceedings
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Materials of solid-state devices
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