Irradiation effect of low energy nitrogen-ion beam during pulsed laser deposition process on the structural and bonding properties of carbon-nitride thin films.

ZHAO J P; CHEN Z Y; YANO T; OOIE T; YONEDA M

Art

J-GLOBAL ID：200902172270395420 Reference number：01A0350961

Irradiation effect of low energy nitrogen-ion beam during pulsed laser deposition process on the structural and bonding properties of carbon-nitride thin films.

窒化炭素薄膜の構造と結合特性に及ぼすパルスレーザ蒸着中の低エネルギー窒素イオンビームの照射効果

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Author (5)： , , , ,
Material：
Volume： 89 Issue： 3 Page： 1580-1587 Publication year： Feb. 01, 2001
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Irradiational changes of other materials

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