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J-GLOBAL ID:200902173735526298   Reference number:98A1005066

Photoacid and Photobase Generators: Prospects and Their Use in the Development of Polymeric Photosensitive Systems.

光酸及び塩基発生剤 重合体感光系の開発における見通しとその用途
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Volume: 71  Issue: 11  Page: 2483-2507  Publication year: Nov. 1998 
JST Material Number: G0450A  ISSN: 0009-2673  CODEN: BCSJA8  Document type: Article
Article type: 文献レビュー  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

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Reference (134):
  • 1) J. V. Crivello, J. H. W. Lam, and C. N. Volante, J. Radiat. Curing, 2 July, (1977).
  • 2) J. V. Crivello and J. H. W. Lam, Macromolecules, 10, 1307 (1977).
  • 3) a) S. P. Pappas, B. C. Pappas, and L. R. Gatechair, J. Polym. Sci.: Polym. Chem. Ed., 22, 69 (1984);
  •  b) J. P. Fouassier and J. F. Rabek, “Radiation Curing in Polymer Science and Technology,” Elsevier Science Publishers, London (1993), Vol. II, p. 435.
  • 4) J. V. Crivello and J. H. Lam, J. Polym. Sci.: Polym. Chem. Ed., 16, 2441 (1978).
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