Origin and thermal stability of H<sub>k</sub> in FeTaN thin films.

MINOR M K; BARNARD J A

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J-GLOBAL ID：200902174202908381 Reference number：99A0563294

Origin and thermal stability of H_k in FeTaN thin films.

FeTaN薄膜のH_Kの起源と熱安定性

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Volume： 85 Issue： 8, Pt.2A Page： 4565-4567 Publication year： Apr. 15, 1999
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Magnetic anisotropy and magnetomechanical effects of metals , Magnetic materials

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Origin and thermal stability of Hk in FeTaN thin films.

Origin and thermal stability of H_k in FeTaN thin films.