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J-GLOBAL ID:200902175523598305   Reference number:93A0188239

Effect of thermal annealing on the Raman spectrum of Si1-xGex grown on Si.

Si上に成長させたSi1-xGexのRamanスペクトルに及ぼす熱アニールの効果
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Volume: 73  Issue:Page: 414-417  Publication year: Jan. 01, 1993 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films 
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