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J-GLOBAL ID:200902176373895256   Reference number:00A0154884

Initial Oxygen Interaction between Ge(100) and Ge/Si(100) Surfaces Compared by Scanning Tunneling Microscopy.

走査型トンネル顕微鏡により比較したGe(100)表面とGe/Si(100)表面との初期酸素相互作用
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Volume: 38  Issue: 12A  Page: L1450-L1452  Publication year: Dec. 01, 1999 
JST Material Number: F0599B  ISSN: 0021-4922  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Study of adsorption by physical means 
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