Art

J-GLOBAL ID：200902177162374604   Reference number：00A0240135

Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography.

真空紫外リソグラフィー用の単一層レジストの設計概念

Author (5)： KISHIMURA S (Matsusita Electronics Corp., Kyoto, JPN) ,  KATSUYAMA A (Matsusita Electronics Corp., Kyoto, JPN) ,  SASAGO M (Matsusita Electronics Corp., Kyoto, JPN) ,  SHIRAI M (Osaka Prefecture Univ., Osaka, JPN) ,  TSUNOOKA M (Osaka Prefecture Univ., Osaka, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 38  Issue： 12B  Page： 7103-7108  Publication year： Dec. 30, 1999 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： vacuum ultraviolet radiation ,...
Semi thesaurus term： polyhydroxystyrene ,...

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=00A0240135&from=J-GLOBAL&jstjournalNo=G0520B") }}

JST classification (1)： Techniques for samples  (BA02070O)

Reference (4)：

• 1) M. Sasago: J. Photopolym. Sci. Technol. 12 (1999) 585.
• 2) T. M. Bloomstein, M. W. Horn, M. Rothschild, R. R. Kunz, S. T. Palmacci and R. B. Goodman: J. Vac. Sci. Technol. B 15 (1997) 2112.
• 3) T. M. Bloomstein, M. Rothschild, R. R. Kunz, D. E. Hardy, R. B. Goodman and S. T. Palmacci: J. Vac. Sci. Technol. B 16 (1998) 3154.
• 4) J. F. Rabek: Mechanisms of Photophysical Process and Photochemical Reactions in Polymers (John Wiley & Sons, New York, 1987) p. 528.

Terms in the title (4)： リソグラフィー ,  単一層 ,  レジスト ,  設計概念