Characteristics of CA Resist in EUV Lithography.

HAMAMOTO K; WATANABE T; HADA H; KOMANO H; KINOSHITA H

Art

J-GLOBAL ID：200902177997552740 Reference number：02A0616881

Characteristics of CA Resist in EUV Lithography.

EUVリソグラフィーにおけるCAレジストの特徴

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Material：
Volume： 15 Issue： 3 Page： 361-366 Publication year： 2002
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Various photographies

Reference (13)：

1). H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii: J. Vac. Sci. Technol. B7, 1648 (1989).
2). International Technology Roadmap for Semiconductors, International SEMATECH, 2000.
3). T. Watanabe, K. Mashima, M. Niibe and H. Kinoshita: Jpn. J. Appl. Phys. 36, 7579 (1997).
4). H. Kinoshita, T. Watanabe, D. Bajuk, J. Daniel, Y. Kimpara, M. Kriese and Y. Platonov: Proc. SPIE 3767, 164 (1999).
5). T. Watanabe, H. Kinoshita, H. Nii, Y. Li, K. Hamamoto, T. Oshino, K. Sugisaki, K. Murakami, S. Irie, S. Shirayone, Y. Gomei and S. Okazaki: J. Vac. Sci. Technol. B18 (6), 2905 (2000).

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