蛍光体への低速電子線侵入深さの検討  Y<sub>2</sub>O<sub>3</sub>薄膜

MAGAMI TAKESHI; WADA HIDEKI; KOMINAMI HIROKO; NAKANISHI YOICHIRO; HATANAKA YOSHINORI

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J-GLOBAL ID：200902180074493637 Reference number：01A0768503

蛍光体への低速電子線侵入深さの検討 Y₂O₃薄膜

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Author (5)： , , , ,
Material：
Volume： 68th Page： 283 Publication year： Mar. 25, 2001
JST Material Number： Y0048A Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Oxide thin films , Luminescence of inorganic compounds

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蛍光体への低速電子線侵入深さの検討 Y2O3薄膜

蛍光体への低速電子線侵入深さの検討 Y₂O₃薄膜