Art
J-GLOBAL ID：200902182310342648   Reference number：00A0001552

Indium doping of amorphous SiC:H films prepared by reactive magnetron co-sputtering.

反応性マグネトロン共スパッタリングによって作成した非晶質SiC:H膜のインジウムドーピング
Author (4)：
SAITO N

About SAITO N

(Takamatsu National Coll. Technol., Takamatsu, JPN)

About Takamatsu National Coll. Technol., Takamatsu, JPN

, 
INUI Y

About INUI Y

(Shizuoka Univ., Hamamatsu, JPN)

About Shizuoka Univ., Hamamatsu, JPN

, 
YAMAGUCHI T

About YAMAGUCHI T

(Shizuoka Univ., Hamamatsu, JPN)

About Shizuoka Univ., Hamamatsu, JPN

, 
NAKAAKI I

About NAKAAKI I

(Fuji Industrial Res. Inst. Shizuoka Prefecture, Fuji, JPN)

About Fuji Industrial Res. Inst. Shizuoka Prefecture, Fuji, JPN


Material：
Thin Solid Films

About Thin Solid Films


Volume： 353  Issue： 1/2  Page： 189-193  Publication year： Sep. 29, 1999 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
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All keywords is available on JDreamIII(charged).
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reactive sputtering

About reactive sputtering

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Photoconduction,photoelectromotive force 
(BM03050J)

About Photoconduction,photoelectromotive force

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
反応性

About 反応性

, 
マグネトロン

About マグネトロン

, 
共スパッタリング

About 共スパッタリング

, 
インジウム

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, 
ドーピング

About ドーピング


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