Co-operation process of plasma CVD and sputtering, using methane, SF<sub>6</sub> and Ar mixture gas, and gold plate discharge electrode.

MATSUSHITA M; KASHEM A; MORITA S

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J-GLOBAL ID：200902183936405133 Reference number：02A0462060

Co-operation process of plasma CVD and sputtering, using methane, SF₆ and Ar mixture gas, and gold plate discharge electrode.

メタン,SF₆及びAr混合ガスと金プレート放電電極を用いたプラズマCVDとスパッタリングの協調プロセス

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Volume： 407 Issue： 1/2 Page： 50-53 Publication year： Mar. 22, 2002
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Thin films of other inorganic compounds , Optical properties of condensed matter in general

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Co-operation process of plasma CVD and sputtering, using methane, SF6 and Ar mixture gas, and gold plate discharge electrode.

Co-operation process of plasma CVD and sputtering, using methane, SF₆ and Ar mixture gas, and gold plate discharge electrode.