Art
J-GLOBAL ID：200902185388533589   Reference number：94A0353012

Influence of substrate on structural properties of TiO2 thin films obtained via MOCVD.

MOCVDで作製したTiO2薄膜の構造に対する基板の効果
Author (4)：
BATTISTON G A

About BATTISTON G A

(Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA)

About Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA

, 
GERBASI R

About GERBASI R

(Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA)

About Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA

, 
PORCHIA M

About PORCHIA M

(Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA)

About Inst. Chimica e Tecnologie Inorganiche e dei Materiali Avanzati, C.N.R., Padova, ITA

, 
MARIGO A

About MARIGO A

(Univ. Padova, Padova, ITA)

About Univ. Padova, Padova, ITA


Material：
Thin Solid Films

About Thin Solid Films


Volume： 239  Issue： 2  Page： 186-191  Publication year： Mar. 01, 1994 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
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MOCVD

About MOCVD

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
MOCVD

About MOCVD

, 
作製

About 作製

, 
TiO2

About TiO2

, 
薄膜

About 薄膜


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