Thermal stability of polycrystalline silicon electrodes on ZrO<sub>2</sub> gate dielectrics.

PERKINS C M; TRIPLETT B B; MCLNTYRE P C; SARASWAT K C; SHERO E

Art

J-GLOBAL ID：200902186251759209 Reference number：02A0698411

Thermal stability of polycrystalline silicon electrodes on ZrO₂ gate dielectrics.

ZrO₂ゲート誘電体上の多結晶質シリコン電極の熱安定性

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=02A0698411&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=02A0698411&from=J-GLOBAL&jstjournalNo=H0613A") }}

Author (5)： , , , ,
Material：
Volume： 81 Issue： 8 Page： 1417-1419 Publication year： Aug. 19, 2002
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=02A0698411&from=J-GLOBAL&jstjournalNo=H0613A") }}

Oxide thin films

, , ,

Return to Previous Page

Thermal stability of polycrystalline silicon electrodes on ZrO2 gate dielectrics.

Thermal stability of polycrystalline silicon electrodes on ZrO₂ gate dielectrics.