Effect of ion implantation and surface structure of silicon  on diamond film nucleation.

KOBAYASHI K; KUMAGAI M; KARASAWA S; WATANABE T; TOGASHI F

Art

J-GLOBAL ID：200902186690835094 Reference number：93A0423332

Effect of ion implantation and surface structure of silicon on diamond film nucleation.

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Author (5)： , , , ,
Material：
Volume： 128 Issue： 1/4 Pt 1 Page： 408-412 Publication year： Mar. 1993
JST Material Number： B0942A ISSN： 0022-0248 Document type： Article
Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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