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J-GLOBAL ID：200902187282383955   Reference number：96A0004639

Imprint of sub-25nm vias and trenches in polymers.

高分子への25nm以下のバイアスとトレンチのプリント
Author (3)：
CHOU S Y

About CHOU S Y

(Univ. Minnesota, Minnesota)

About Univ. Minnesota, Minnesota

, 
KRAUSS P R

About KRAUSS P R

(Univ. Minnesota, Minnesota)

About Univ. Minnesota, Minnesota

, 
RENSTROM P J

About RENSTROM P J

(Univ. Minnesota, Minnesota)

About Univ. Minnesota, Minnesota


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 67  Issue： 21  Page： 3114-3116  Publication year： Nov. 20, 1995 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
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nanostructure

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,...
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Thesaurus term/Semi thesaurus term
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dot

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JST classification (1)：
JST classification
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Manufacturing technology of solid-state devices 
(NC03030V)

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Terms in the title (3)：
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高分子

About 高分子

, 
バイアス

About バイアス

, 
トレンチ

About トレンチ


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