Suppressed Aggregate Extraction Development (SAGEX) Resists.

YAMAGUCHI T; NAMATSU H; NAGASE M; YAMAZAKI K; KURIHARA K

Art

J-GLOBAL ID：200902187693102094 Reference number：00A0692960

Suppressed Aggregate Extraction Development (SAGEX) Resists.

凝集抑制抽出現像(SAGEX)レジスト

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Author (5)： , , , ,
Material：
Volume： 13 Issue： 3 Page： 427-433 Publication year： 2000
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Photographic agents

Reference (15)：

1). Y. Nakajima, Y. Takahashi, S. Horiguchi, K. Iwadate, H. Namatsu, K. Kurihara, and M. Tabe, Appl. Phys. Lett., 65 (1994) 2833.
2). H. Namatsu, S. Horiguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol., B15 (1997) 1688.
3). Y. Takahashi, H. Namatsu, K. Kurihara, K. Iwadate, M. Nagase, and K. Murase, IEEE Trans. Electron Devices ED-43 (1996) 1213.
4). M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate, K. Murase and T. Makino, Microelectron. Eng. 30 (1996) 419.
5). H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase and K. Kurihara, J. Vac. Sci. Technol. B16 (1998) 69.

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