Art
J-GLOBAL ID:200902190102655902
Reference number:02A0625578
Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System.
ETS-1三非球面ミラーイメージングシステムを用いた微細パターン認識
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Material:
Volume:
41
Issue:
6B
Page:
4105-4110
Publication year:
Jun. 30, 2002
JST Material Number:
G0520B
ISSN:
0021-4922
Document type:
Article
Article type:
短報
Country of issue:
Japan (JPN)
Language:
ENGLISH (EN)
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Manufacturing technology of solid-state devices
Reference (13):
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1) H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii: J. Vac. Sci. Technol. B7 (1989) 1648.
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2) International Technology Roadmap for Semiconductors, International SEMATECH, 2000.
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3) T. Watanabe, K. Mashima, M. Niibe and H. Kinoshita: Jpn. J. Appl. Phys. 36 (1997) 7597.
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4) H. Kinoshita, T. Watanabe, D. Bajuk, J. Daniel, Y. Kimpara, M. Kriese and Y. Platonov: Proc. SPIE 3767 (1999) 164.
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5) T. Watanabe, H. Kinoshita, H. Nii, Y. Li, K. Hamamoto, T. Oshino, K. Sugisaki, K. Murakami, S. Irie, S. Shirayone, Y. Gomei and S. Okazaki: J. Vac. Sci. Technol. B18 (2000) 2905.
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