Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step.

DAESCHNER W; LARSSON M; LEE S H

Art

J-GLOBAL ID：200902190581337545 Reference number：95A0539335

Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step.

アナログレジスト上の電子ビーム直接描画及び単独化学支援イオンビームエッチングステップを用いたモノリシック回折光学素子の製造

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Material：
Volume： 34 Issue： 14 Page： 2534-2539 Publication year： May. 10, 1995
JST Material Number： B0026B ISSN： 1559-128X CODEN： APOPAI Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Optical devices in general , Manufacturing technology of solid-state devices

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