Defect dominated charge transport in amorphous Ta<sub>2</sub>O<sub>5</sub> thin films.

FLEMING R M; LANG D V; JONES C D W; STEIGERWALD M L; ALERS G B; WONG Y-H; VAN DOVER R B; KWO J R; SERGENT A M

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J-GLOBAL ID：200902192148986272 Reference number：00A0852934

Defect dominated charge transport in amorphous Ta₂O₅ thin films.

アモルファスTa₂O₅薄膜における欠陥支配電荷輸送

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Author (9)： , , , , , , , ,
Material：
Volume： 88 Issue： 2 Page： 850-862 Publication year： Jul. 15, 2000
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Metal-insulator-metal structures , Oxide thin films

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Defect dominated charge transport in amorphous Ta2O5 thin films.

Defect dominated charge transport in amorphous Ta₂O₅ thin films.