Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O<sub>3</sub> films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target.

THOMAS R; MOCHIZUKI S; MIHARA T; ISHIDA T

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J-GLOBAL ID：200902193171686266 Reference number：02A0669505

Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O₃ films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target.

化学量論的酸化物ターゲットを用いた高周波マグネトロンスパッタリングによって作製したPt/Ti/Si基板上のPb(Zr,Ti)O₃薄膜の結晶化に及ぼす基板温度の影響

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Material：
Volume： B95 Issue： 1 Page： 36-42 Publication year： Jul. 01, 2002
JST Material Number： T0553A ISSN： 0921-5107 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Oxide thin films

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Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O3 films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target.

Effect of substrate temperature on the crystallization of Pb(Zr,Ti)O₃ films on Pt/Ti/Si substrates prepared by radio frequency magnetron sputtering with a stoichiometric oxide target.