Art
J-GLOBAL ID：200902194544900200
Reference number：95A0428219
Etching of Si(111)-(7×7) and Si(100)-(2×1) surfaces by atomic hydrogen.
原子状水素によるSi(111)-(7×7)とSi(100)-(2×1)表面のエッチング
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Author (3)：
,
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Material：
Volume：
66
Issue：
14
Page：
1818-1820
Publication year：
Apr. 03, 1995
JST Material Number：
H0613A
ISSN：
0003-6951
CODEN：
APPLAB
Document type：
Article
Article type：
短報
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Surface structure of semiconductors
, Techniques for samples
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