The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films.

HOTOVY I; HURAN J; SPIESS L; LIDAY J; SITTER H; HASCIK S

Art

J-GLOBAL ID：200902196253223573 Reference number：03A0086240

The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films.

スパッタNiO薄膜の物理特性に及ぼすプロセスパラメータ及びアニール温度の影響

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Material：
Volume： 69 Issue： 1/3 Page： 237-242 Publication year： Dec. 24, 2002
JST Material Number： E0347A ISSN： 0042-207X Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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Oxide thin films , Analytical instruments

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