Art
J-GLOBAL ID：200902197190991695   Reference number：99A0419943

Reliability Projection for Ultra-Thin Oxides at Low Voltage.

低電圧における超薄酸化膜の信頼性予測
Author (2)：
STATHIS J H

About STATHIS J H

(IBM Res. Div., NY, USA)

About IBM Res. Div., NY, USA

, 
DIMARIA D J

About DIMARIA D J

(IBM Res. Div., NY, USA)

About IBM Res. Div., NY, USA


Material：
Technical Digest. International Electron Devices Meeting  (IEEE International Electron Devices Meeting)

About Technical Digest. International Electron Devices Meeting


Volume： 1998  Page： 167-170  Publication year： 1998 
JST Material Number： C0829B  ISSN： 0163-1918  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*MOSFET

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
ゲート酸化膜

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,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Transistors 
(NC03070N)

About Transistors

,  Measurement,testing and reliability of solid-state devices 
(NC03040G)

About Measurement,testing and reliability of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
低電圧

About 低電圧

, 
酸化膜

About 酸化膜

, 
信頼性予測

About 信頼性予測


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