Art
J-GLOBAL ID：200902197238138590   Reference number：97A0621278

Advanced Material Analysis Technologies. Secondary Ion Mass Spectrometry Techniques for Semiconductor Analysis.

超微量分析技術 半導体の二次イオン質量分析技術
Author (2)：
TOMITA MITSUHIRO

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(東芝 研開セ)

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, 
HONGO CHIE

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(東芝 研開セ)

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Material：
東芝レビュー  (Toshiba Review)

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Volume： 52  Issue： 6  Page： 35-38  Publication year： Jun. 1997 
JST Material Number： F0360A  ISSN： 0372-0462  CODEN： TORBA  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*secondary ion mass spectrometry

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,...
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supermicro analysis

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Measurement,testing and reliability of solid-state devices 
(NC03040G)

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微量分析

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, 
二次イオン質量分析

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