Formation of silica gel surfaces having lipophobic and hydrophobic characters by a radio-frequency CF<sub>4</sub> plasma treatment.

FURUKAWA K; IJIRI H; TERAYAMA H; NAGATA H; YAMAZAKI S; YAMAUCHI H; MURAOKA K

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J-GLOBAL ID：200902198493132977 Reference number：01A0080090

Formation of silica gel surfaces having lipophobic and hydrophobic characters by a radio-frequency CF₄ plasma treatment.

ラジオ周波数のCF₄プラズマ処理による疎油性および疎水性をもつシリカゲル表面の生成

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Author (7)： , , , , , ,
Material：
Volume： 19 Issue： 17 Page： 1545-1547 Publication year： Sep. 01, 2000
JST Material Number： D0919B ISSN： 0261-8028 CODEN： JMTSAS Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Adsorbents , Irradiational changes of other materials

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Formation of silica gel surfaces having lipophobic and hydrophobic characters by a radio-frequency CF4 plasma treatment.

Formation of silica gel surfaces having lipophobic and hydrophobic characters by a radio-frequency CF₄ plasma treatment.