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J-GLOBAL ID:200902199106236170   Reference number:02A0409709

光触媒技術の新展開 新たな高機能性材料薄膜製造プロセスの開発

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Material:
Volume: 41  Issue:Page: 247-250  Publication year: Apr. 20, 2002 
JST Material Number: F0163A  ISSN: 1340-2625  CODEN: MTERE2  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Oxide thin films 
Reference (17):
  • (1) 橋本和仁, 藤嶋昭: 酸化チタン光触媒のすべて, CMC (株),(1998).
  • (2) A. Fujishima, K. Hashimoto and T. Watanabe: TiO2 PHOTOCATAL YSIS, Fundamentals and Applications, Bkc a,(1999).
  • (3) 東レリサーチセンター編: 光触媒の最新技術動向,(1998), 56.
  • (4) 大石隆伸: 光触媒製品フォーラム,(2001), 21.
  • (5) 吉田隆: 最新光触媒技術,(株) エス・ティー・エヌ,(2000).
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