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J-GLOBAL ID:200902209434269189   Reference number:03A0433450

XPS Analysis of Dopant Penetration in Joined p-n Silicon-Germanium Semiconductor

p-n接合シリコン-ゲルマニウムにおけるドーパント移動のXPS分析
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Volume: 111  Issue: 1294  Page: 436-438  Publication year: Jun. 01, 2003 
JST Material Number: F0382A  ISSN: 0914-5400  CODEN: JCSJEW  Document type: Article
Article type: 短報  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor-semiconductor contacts with Gr.13-15 element compounds  ,  Diffusion in solids in general  ,  Physical analysis of elements in inorganic substances 
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