Fabrication of silicon nanostructured films by deposition of size-selected nanoparticles generated by pulsed laser ablation

SETO T; ORII T; HIRASAWA M; AYA N

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J-GLOBAL ID：200902211939764111 Reference number：03A0542481

Fabrication of silicon nanostructured films by deposition of size-selected nanoparticles generated by pulsed laser ablation

パルスレーザアブレーションによって生成した粒径選択ナノ粒子堆積によるシリコンナノ構造薄膜の作製

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Material：
Volume： 437 Issue： 1/2 Page： 230-234 Publication year： Aug. 01, 2003
JST Material Number： B0899A ISSN： 0040-6090 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Semiconductor thin films , Techniques and equipment of thin film deposition

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