Art
J-GLOBAL ID:200902212041557302   Reference number:06A0065764

Precise Micro Pattern Replication by Hot Embossing

ホットエンボス成形による精細な微細パターンの転写
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Material:
Volume: 49  Issue:Page: 69-73  Publication year: Jan. 15, 2006 
JST Material Number: G0026B  ISSN: 1344-7912  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
Reference (5):
  • BEKER, E. W. Fabrication of Microstructures with High Aspect Ratios and Great Structural Heights by Synchrotron Radiation Lithography, Galvanoforming and Plastic Molding. Microelectron Eng. 1986, 4, 35-42
  • HATTORI, T. Application of Synchrotron Radiation to Nano Micro Manufacturing. Welding Society Magazine. 2002, 71, 3, 5-14
  • YAMADA, T. Development of Vacuum Hot Embossing Equipment. Journal of the Society of Plant Engineers Japan. 2002, 91-95
  • YAMADA, T. Design of a New Hot Embossing Equipment for Fabrication of Microstructures. JMSE/AMSE International Conference on Materials and Processing 2002, Proceedings. 2002, 597-600
  • MEKARU, H. A Deep X-ray Lithography in the "NewSUBARU". 2002 International Microprocessors and Nanotechnology Conference, Nov. 6-8. 2002, 108-109
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