Art

J-GLOBAL ID：200902217369808215   Reference number：05A1021055

Enhancement of transport critical current density of epitaxial Nb film by lithography

リソグラフィーによるエピタクシーNb膜の輸送臨界電流密度の増大

Author (6)： YAMADA H. (Electrical and Computer Engineering, Maizuru National Coll. of Technol., 234 Aza Shiroya, Maizuru, Kyoto 625-8511, JPN) ,  HARADA N. (Dep. of Electrical and Electronics Engineering, Fac. of Engineering, Yamaguchi Univ., 2-16-1 Tokiwadai, Ube 755-8611 ...) ,  KANAYAMA K. (Electrical and Computer Engineering, Maizuru National Coll. of Technol., 234 Aza Shiroya, Maizuru, Kyoto 625-8511, JPN) ,  NAKAGAWA S. (Electrical and Computer Engineering, Maizuru National Coll. of Technol., 234 Aza Shiroya, Maizuru, Kyoto 625-8511, JPN) ,  YAMASAKI H. (National Inst. of Advanced Industrial Sci. and Technol., Tsukuba Center 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, JPN) ,  HAMAJIMA T. (Tohoku Univ., 1-1 Katahira 2-chome, Aoba-ku, Sendai 980-8577, JPN)
Material： Physica C. Superconductivity and Its Applications  (Physica C. Superconductivity)
Volume： 433  Issue： 1-2  Page： 65-69  Publication year： Dec. 01, 2005 
JST Material Number： T0580A  ISSN： 0921-4534  Document type： Article
Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Terms in the title (5)： リソグラフィー ,  エピタクシー ,  Nb ,  輸送 ,  臨界電流密度