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J-GLOBAL ID:200902222161270215   Reference number:05A1032777

Study on anisotropic silicon etching characteristics in various surfactant-added tetramethyl ammonium hydroxide water solutions

界面活性剤を添加した種々のテトラメチル水酸化アンモニウム水溶液中の異方性シリコンエッチング特性の研究
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Volume: 15  Issue: 11  Page: 2028-2037  Publication year: Nov. 2005 
JST Material Number: W1424A  ISSN: 0960-1317  CODEN: JMMIEZ  Document type: Article
Article type: 原著論文  Country of issue: United Kingdom (GBR)  Language: ENGLISH (EN)
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Manufacturing technology of solid-state devices 

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