Synthesis of Photosensitive and Thermosetting Poly(phenylene ether) Based on Poly[2,6-di(3-methyl-2-butenyl)phenol-co-2,6-dimethyl-phenol] and a Photoacid Generator

MATSUMOTO K; SHIBASAKI Y; ANDO S; UEDA M

Art

J-GLOBAL ID：200902225884599427 Reference number：05A0051499

Synthesis of Photosensitive and Thermosetting Poly(phenylene ether) Based on Poly[2,6-di(3-methyl-2-butenyl)phenol-co-2,6-dimethyl-phenol] and a Photoacid Generator

ポリ[2,6-ジ(3-メチル-2-ブテニル)フェノール-co-2,6-ジメチルフェノール]と光酸発生剤からなる感光性及び熱硬化性ポリ(フェニレンエーテル)の合成

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Material：
Volume： 43 Issue： 1 Page： 149-156 Publication year： Jan. 01, 2005
JST Material Number： C0337C ISSN： 0887-624X CODEN： JPLCAT Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Polycondensation , Manufacturing technology of solid-state devices

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