Art
J-GLOBAL ID：200902227464193754   Reference number：04A0097705

Monitoring and control of RF thermal plasma diamond deposition via substrate biasing

基板バイアスによるRF熱プラズマダイヤモンド蒸着の監視と制御
Author (3)：
OBERSTE BERGHAUS J

About OBERSTE BERGHAUS J

(McGill Univ., Montreal, CAN)

About McGill Univ., Montreal, CAN

, 
MEUNIER J-L

About MEUNIER J-L

(McGill Univ., Montreal, CAN)

About McGill Univ., Montreal, CAN

, 
GITZHOFER F

About GITZHOFER F

(Univ. Sherbrooke, CAN)

About Univ. Sherbrooke, CAN


Material：
Measurement Science and Technology  (Meas Sci Technol)

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Volume： 15  Issue： 1  Page： 161-164  Publication year： Jan. 2004 
JST Material Number： C0354C  ISSN： 0957-0233  CODEN： MSTCEP  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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*Diamond

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,...
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JST classification (1)：
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Semiconductor thin films 
(BK14040E)

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Substance index (1)：
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Methane

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Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
基板バイアス

About 基板バイアス

, 
RF

About RF

, 
熱プラズマ

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, 
ダイヤモンド

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, 
蒸着

About 蒸着


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