Art

J-GLOBAL ID：200902227984540350   Reference number：05A0675879

Skeletal silica characterization in porous-silica low-dielectric-constant films by infrared spectroscopic ellipsometry

赤外分光偏光解析法による多孔質シリカ低誘電率薄膜中の骨格シリカの評価

Author (5)： TAKADA Syozo (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  HATA Nobuhiro (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  SEINO Yutaka (National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN) ,  FUJII Nobutoshi (Assoc. of Super-Advanced Electronics Technol., Ibaraki, JPN) ,  KIKKAWA Takamaro (Hiroshima Univ., Hiroshima, JPN)
Material： Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)
Volume： 97  Issue： 11  Page： 113504.1-113504.5  Publication year： Jun. 01, 2005 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *porous medium ,...
Semi thesaurus term： *silica ,...

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JST classification (3)： Oxide thin films  (BK14050P) ,  Optical properties of condensed matter in general  (BM08010A) ,  Mechanical properties of solids in general  (BL01021C)

Terms in the title (7)： 赤外分光 ,  偏光解析法 ,  多孔質シリカ ,  低誘電率薄膜 ,  骨格 ,  シリカ ,  評価