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J-GLOBAL ID:200902230253819518   Reference number:03A0728720

X-Ray Evaluation of SiO2/Cu/TiN Films Deposited by Ion Plating

イオン・プレーティング法により形成したSiO2/Cu/TiN積層膜のX線的評価
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Volume: 52  Issue: 10  Page: 1231-1236  Publication year: Oct. 15, 2003 
JST Material Number: F0385A  ISSN: 0514-5163  CODEN: ZARYA  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Semiconductor integrated circuit 
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